{"id":197,"date":"2021-01-06T18:14:48","date_gmt":"2021-01-06T17:14:48","guid":{"rendered":"https:\/\/stage.mariobirkholz.de\/?page_id=197"},"modified":"2021-08-01T21:03:37","modified_gmt":"2021-08-01T19:03:37","slug":"evolution-of-structure-in-thin-films","status":"publish","type":"page","link":"https:\/\/mariobirkholz.de\/de\/materials-research\/evolution-of-structure-in-thin-films\/","title":{"rendered":"Evolution der Struktur in d\u00fcnnen Schichten"},"content":{"rendered":"\t\t
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Evolution of Structure in Thin Films<\/h2>\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t
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The growth of thin polycrystalline films is often associated with preferred orientation of crystallites where certain crystallographic directions of grains (hkl) are preferentially oriented parallel to the substrate normal n. The phenomenon has long been known and is named layer texture or fibre texture. The rotational symmetry of the orientation distribution function (ODF) simply derives from the deposition geometry when n is the single exaggerated direction.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t

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The thorough investigation of textures may reveal details of the mechanisms of film growth and is a heavily investigated field in thin film research today. It is expected that through the control of crystalline orientation thin films with optimised properties can be pre\u00adpared which is of great interest for instance for high-Tc superconductors, semiconducting Si films, hard and abrasion-resistant nitride coatings, transparent conductive oxides as they are used in solar cells, flat-panel displays and organic light-emitting diodes. <\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/section>\n\t\t\t\t

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Regarding the physical principles governing preferred orientations in thin films, one first has to consider the surface energy of the low-indexed crystallographic lattice planes. Lattice planes with high atomic densities and low surface energy are generally favoured. In addition, preferred orientations were often found to increase with increasing film thickness which probably might be understood from a grain-to-grain epitaxy. Moreover, the texture may be controlled in CVD processes by the choice of precursors or in plasma-assisted PVD processes by the ion bombardment during growth. In-situ investigations of thin film growth revealed the important role of mechanical stresses within the film which were found to strongly effect the evolution of texture.<\/p>\t\t\t\t\t\t\t\t<\/div>\n\t\t\t\t<\/div>\n\t\t\t\t\t<\/div>\n\t\t<\/div>\n\t\t\t\t

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Investigations on texture\/preferred orientation were performed with colleagues from Hahn-Meitner Institut Berlin and were related to<\/p>